Semiconductor Application
Hydrogen or ammonia is used for the semiconductor manufacturing processes.
Exhaust gas containing NH3 is usually treated by DFI,RTO and CCS, however it causes a secondary problem of NOx and N2O formation.
Our NHN catalysts can make possible to treat NH3 and organic nitrogen gases effectively having with less generation of NOx and N2O.
We have already had many references for the application.
In addition, ozone is used in the semiconductor washing process.
Our NHC catalysts are workable with high performance at wide ranges of ozone concentrations and temperatures.
Ammonia(NH3) Destruction
| Catalyst Inlet | Catalyst Outlet | Conversion | |
|---|---|---|---|
| NH3 | 5,000ppm | <1ppm | >99.9% |
| NOx | - | 10ppm | - |
| N2O | - | 162ppm | - |
*Catalyst: NHN(NH3 Destruction Catalyst)
Ozone Destruction
| Catalyst Inlet | Catalyst Outlet | |
|---|---|---|
| Ozone | 112ppm | <0.1ppm |
*Catalyst: NHC(Ozone Destruction Catalyst)
Product Description
Performance Data
Contact Sales Department
| Department | Environmental Catalyst Div. |
|---|---|
| Contact Form | |
| TEL | 81-3-5436-8479 |
| FAX | 81-3-5436-8680 |